Device and methods for CMOS image sensor having borderless contact

ABSTRACT

A photodiode device including a well located in a substrate, a floating node located in the well and shallow trench isolation (STI) regions located over and laterally opposing the floating node. A borderless contact buffer layer is located over at least the floating node, and an interlevel dielectric layer is located over the borderless contact buffer layer. A borderless contact extends through the interlevel dielectric layer and the borderless contact buffer layer to the floating node.

This application is a divisional of patent application Ser. No.10/626,061, entitled “CMOS Image Sensor Device and Method,” filed onJul. 24, 2003, now U.S. Pat. No. 6,946,352 which application isincorporated herein by reference.

TECHNICAL FIELD

The present invention is directed, in general, to photodiode devices andmethods, and, in particular, to CMOS image sensor devices and methods.

BACKGROUND

An image sensor is an apparatus for receiving light, i.e., photons,generated by or reflected from an object, and for generating digitalimage data. The manufacture of one particular type of image sensor mayincorporate conventional complementary metal-oxide-semiconductor (CMOS)fabrication technology. Accordingly, such an image sensor is oftenreferred to as a CMOS image sensor (CIS).

Generally, a CMOS image sensor includes a light sensing region forconverting photon energy received from an object to an electrical signal(such as current) and a peripheral circuit region for processing andsending the electrical signal to another device for further processing.A photodiode is formed in the light sensing region, and transistors orother devices may be formed in the peripheral circuit region, therebyforming a semiconductor structure. An interconnect structure including aplurality of insulating layers and metal lines is formed over thesemiconductor structure to interconnect the photodiode, transistors andother devices.

However, the design of the interconnect structure is typically based ondesired electrical characteristics and device reliability rather than onoptical characteristics. As a result, optical transmittance may bedegraded by optical reflections at the interfaces between the layers ofthe semiconductor and interconnect structures.

For example, silicide layers are often employed to improve theelectrical coupling of interconnected devices. However, silicides areoptically opaque and exhibit excessive junction leakage. Therefore, ashallow-trench-isolation (STI) element may be formed over thephotodiode, so that the photodiode is effectively masked during thesilicidation process. However, the abrupt transition from the relativelylow refractive index silicon dioxide layer to the relatively highrefractive index silicon layer may cause high reflection of the opticalenergy.

Continued scaling of semiconductor devices has introduced the use ofborderless contacts (see, e.g., U.S. Pat. No. 6,444,566, to Tsai, etal., commonly assigned herewith and incorporated herein by reference).Borderless contacts require the formation of a buffer layer, typicallycomprising SiN or SiON, between the STI and the overlying silicondioxide layer. The borderless contact buffer layer once again introducesoptical problems, causing destructive interference attributable to thevarying refractive indices of the materials formed over the photodiode.That is, the silicon substrate in which the photodiode is formed has arelatively high refractive index, the STI element formed over thephotodiode has a relatively low refractive index, the SiON buffer layerformed over the STI element has a medium refractive index, and thesilicon dioxide layer formed over the buffer layer has a relatively lowrefractive index. Such variation in refractive indices through whichimpinging light must propagate for effective operation of the photodiodewill cause destructive interference of the optical signal, especiallyfor signals having wavelengths approaching the thickness of the STIelement.

Accordingly, what is needed in the art is a photodiode device thataddresses the problems discussed above.

SUMMARY OF THE INVENTION

To address the above-discussed deficiencies of the prior art,embodiments of the present invention provide a photodiode having reducedoptical interference and a method of manufacturing the photodiode. Inone embodiment, the photodiode includes a well located in a substrate, afloating node located in the well and shallow trench isolation (STI)regions located over and laterally opposing the floating node. Aborderless contact buffer layer is located over at least the floatingnode, and a dielectric layer is located over the borderless contactbuffer layer. A borderless contact extends through the dielectric layerand the borderless contact buffer layer to the floating node.

One embodiment of a method of manufacturing a photodiode according toaspects of the present disclosure includes forming a well in asubstrate, forming an STI element at least partially in the well, andremoving a portion of the STI element to form STI regions opposing anexposed portion of the well. A floating node is formed in the exposedportion of the well, and a borderless contact buffer layer is formedover at least the floating node and along sidewalls of the STI regions.A dielectric layer is formed over the borderless contact buffer layer,and a borderless contact is formed extending through the dielectriclayer and the borderless contact buffer layer to the floating node.

The present disclosure also provides a semiconductor deviceincorporating a photodiode having reduced optical interference. In oneembodiment, the device includes first and second adjacent wells locatedin a substrate and a transistor gate structure located over at least aportion of the first well. A floating node is located in the second welland STI regions are located over and laterally opposing the floatingnode. A borderless contact buffer layer is located over at least thefloating node and the transistor gate structure, and a dielectric layeris located over the borderless contact buffer layer. A first borderlesscontact extends through the dielectric layer and the borderless contactbuffer layer to the floating node. A second borderless contact extendsthrough the dielectric layer and the borderless contact buffer layer tothe transistor gate structure. An interconnect is located over thedielectric layer and couples the first and second borderless contacts.

The foregoing has outlined preferred and alternative features of thepresent invention so that those skilled in the art may better understandthe detailed description of the invention that follows. Additionalfeatures of the invention will be described hereinafter that form thesubject of the claims of the invention. Those skilled in the art shouldappreciate that they can readily use the present disclosure as a basisfor designing or modifying other structures for carrying out the samepurposes and/or achieving the same advantages of the present invention.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention is best understood from the following detaileddescription when read with the accompanying figures. It is emphasizedthat, in accordance with the standard practice in the industry, variousfeatures are not drawn to scale. In fact, the dimensions of the variousfeatures may be arbitrarily increased or reduced for clarity ofdiscussion. Reference is now made to the following descriptions taken inconjunction with the accompanying drawings, in which:

FIG. 1 illustrates a sectional view of one embodiment of a semiconductordevice in an intermediate stage of manufacture according to aspects ofthe present disclosure;

FIG. 2 illustrates a sectional view of the device shown in FIG. 1 in asubsequent stage of manufacture;

FIG. 3 illustrates a sectional view of the device shown in FIG. 2 in asubsequent stage of manufacture; and

FIG. 4 illustrates a plan view of the device shown in FIG. 3.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

It is to be understood that the following disclosure provides manydifferent embodiments, or examples, for implementing different featuresof the invention. Specific examples of components and arrangements aredescribed below to simplify the present disclosure. These are, ofcourse, merely examples and are not intended to be limiting. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself necessarily dictate arelationship between the various embodiments and/or configurationsdiscussed. Moreover, the formation of a first feature over or on asecond feature in the description that follows may include embodimentsin which the first and second features are formed in direct physicalcontact, and may also include embodiments in which additional featuresmay be formed interposing the first and second features, such that thefirst and second features may not be in direct physical contact.

Referring initially to FIG. 1, illustrated is a sectional view of oneembodiment of a semiconductor device 100 in an intermediate stage ofmanufacture according to aspects of the present disclosure. The device100 includes a substrate 110 having a well 120 formed therein. The well120 may be one of many wells formed in the substrate 110. In oneembodiment, the well 120 includes a first dopant type and adjacent wells125 include a second dopant type, such as in a complementarymetal-oxide-semiconductor (CMOS) doping scheme. The well 120 may ben-doped, such as with phosphorous or other n−type impurities, orp-doped, such as with boron or other p-type impurities. Alternatively,other MOS devices, such as PMOS or NMOS devices, may be used.

A shallow-trench-isolation (STI) element 130 is formed at leastpartially in the well 120, possibly extending at least partially into aneighboring well 125. The STI element 130 may be of conventionalcomposition and construction. For example, the STI element 130 may befabricated by forming an opening in the substrate 110, such as byanisotropic etching, subsequently thermal-oxidizing the inner surfacesof the trench and then filling the trench with an oxide bychemical-vapor deposition (CVD). The STI element 130 may then becompleted with a planarizing process, such as by chemical-mechanicalpolishing (CMP) or plasma etch-back. Of course, additional and/oralternative processes may be employed to form the STI element 130 withinthe scope of the present disclosure. Moreover, electrically insulativestructures other than an STI element may be alternatively oradditionally formed in the well 120 within the scope of the presentdisclosure.

Gate structures 140, 145 may then be formed over the substrate 110. Thegate structures 140, 145 may be conventional in composition andfabrication. For example, the gate structures 140, 145 may be formed bydepositing a gate oxide layer and a gate electrode layer andsubsequently patterning these layers to form gate oxides 141, 146 andgate electrodes 142, 147. The gate electrodes 142, 147 may comprisedoped polysilicon or other conductive materials. Thereafter, dopedregions such as doped region 150 may be formed by conventional orfuture-developed processes, including ion implantation employing thegate electrode 147 as a mask. The doped regions, such as region 150, maybe source/drain regions. Spacers 155, 156 then may be formed, such as bydepositing and subsequently etching an insulating layer.

The substrate 110 then may be silicided by conventional orfuture-developed processes. As such, a silicide layer 160 may be formedover the gate electrode 142, another silicide layer 162 may be formedover the gate electrode 147, and yet another silicide layer 164 may beformed over or in the doped region 150. However, because the STI element130 and spacers 155, 156 comprise an oxide or other insulating material,no silicide forms over these elements. This may be referred to as aself-aligned silicide, or salicide, process. Although not describedherein, those skilled in the art will recognize that additional and/oralternative processes and materials may be employed to form the gatestructures 140, 145 and doped region 150 within the scope of the presentdisclosure.

Referring to FIG. 2, illustrated is a sectional view of the device 100shown in FIG. 1 in a subsequent stage of manufacture according toaspects of the present disclosure. After the silicidation processdescribed above, a photoresist layer 210 may be deposited over thesubstrate 110 and patterned to form sidewalls 215. The patternedphotoresist layer 210 may then be employed as a mask to remove a portionof the STI element 130, thereby forming one or more STI regions 220. Inthe particular embodiment shown in FIG. 2, a central portion of the STIelement 130 is substantially removed to form opposing STI regions 220having sidewalls 225, thereby exposing a portion of the well 120 betweenthe opposing STI regions 220. The portion of the STI element 130 removedto form the STI regions 220 may be removed by an etching process,including a dry or plasma etching process, a wet etching process or acombination thereof.

Subsequently, a floating node 230 may be formed in the exposed portionof the well 120, such as by an ion implant process employing thepatterned photoresist layer 210 as a mask. In one embodiment, thefloating node 230 is doped to form a higher concentration of theimpurity type in the surrounding well 120. For example, if the well 120is n doped, the floating node 230 may be n+ doped. The ion implantprocess employed to form the floating node 230 may be substantiallysimilar to the process employed to form the well 120, although someprocess parameters may be adjusted to achieve the desired dopantconcentration. The floating node 230 may also be doped opposite to thesurrounding well 120.

Referring to FIG. 3, illustrated is a sectional view of the device 100shown in FIG. 2 in a subsequent stage of manufacture. After the floatingnode 230 is formed, the photoresist layer 210 is removed and aborderless contact buffer layer 310 is formed over various features. Inthe illustrated embodiment, the borderless contact buffer layer 310 isformed over the gate structures 140, 145, the STI regions 220 and theirsidewalls 225, the floating node 230 and the silicide layer 164. Theborderless contact buffer layer 310 may comprise silicon oxynitride orsilicon nitride, and may be formed by chemical-vapor deposition (CVD),plasma enhanced CVD (PECVD) or other processes. The borderless contactbuffer layer 310 may have a thickness ranging between about 25 Angstromsand about 500 Angstroms, although other thicknesses are within the scopeof the present disclosure.

An insulating layer 320 is then formed over the borderless contactbuffer layer 310, such as by spin-on deposition, dry plasma etching,chemical-vapor-deposition, sputter deposition, thermal deposition,evaporation, physical vapor transport or other conventional orfuture-developed processes. In one embodiment, the insulating layer 320may be a pre-metal dielectric layer or an interlevel dielectric layerconventionally employed in interconnect structures. For example, theinsulating layer 320 may comprise plasma enhancedtetraethylorthosilicate (PETEOS), silicon dioxide or other oxides. Inother embodiments, the insulating layer 320 may comprise a lowdielectric (low-k) material, which generally includes materials with adielectric constant less than the dielectric constant of silicon dioxide(e.g., less than about 3.9). Examples include an oxide andmethylsilsesquioxane (“MSQ”) hybrid, an MSQ derivative, a porogen/MSQahybrid, an oxide/hydrogen silsesquioxane (“HSQ,” also known ashydridosilsesquioxane) hybrid, an HSQ derivative, a porogen/HSQ hybrid,and the like. Other materials, such as nanoporous silica, xerogel,polytetrafluoroethylene (“PTFE”), and low-k dielectrics such as SiLK(available from Dow Chemicals of Midland, Mich.), Flare (available fromAlliedSignal of Morristown, N.J., and Black Diamond (available fromApplied Materials of Santa Clara, Calif.) may also be employed for theinsulating layer 320. The insulating layer 320 may also be planarized,such as by a CMP or plasma etch back process.

A borderless contact 330 may then be formed, extending through theinsulating layer 320 and borderless contact buffer layer 310 to thefloating node 230. The borderless contact 330 may be fabricated byforming an opening in the insulating layer 320 and borderless contactbuffer layer 310 and subsequently filling the opening with gold, copper,aluminum, tungsten, doped silicon or another conductive material. Theopening for the borderless contact 330 may be formed by dry-plasmaetching or other etching processes, and the conductive material formingthe borderless contact 330 may be deposited by CVD, sputter deposition,thermal deposition, evaporation, physical vapor transport or otherconventional or future-developed processes. Additional borderlesscontacts 340, 345 may also be formed, possibly concurrently with theborderless contact 330. For example, in the embodiment shown, aborderless contact 340 extends to the gate structure 140 and anotherborderless contact 345 extends to the silicide layer 164 formed in orover the doped region 150.

Interconnects 350 are then formed over the insulating layer 320 tointerconnect two or more of the borderless contacts 330, 340, 345 orother conductive members of an interconnect structure. For example, asshown in FIG. 3, one of the interconnects 350 couples the gate structure140 and the floating node 230 via the borderless contacts 330, 340.

Referring to FIG. 4, illustrated is a plan view of the device 100 shownin FIG. 3 to aid in the discussion of the operation and advantages ofCIS devices constructed according to aspects of the present disclosure.For the purpose of clarity, some features shown in FIG. 3 are not shownin FIG. 4. Accordingly, only the wells 120, 125, the floating node 230,the borderless contacts 330, 345 and the gate structure 145 from FIG. 3are also shown in FIG. 4. In addition, an active region 410 of the CISdevice 100 is illustrated in FIG. 4. Those skilled in the art willrecognize that the active region 410 may not have the well-definedboundaries illustrated in FIG. 4, and that the actual boundaries mayvary from those shown among applications and manufacturing lots.

In a preferred embodiment, the borderless contact buffer layer 310 has amedium refractive index that is higher than the low refractive index ofthe insulating layer 320, but lower than the refractive index of thesilicon floating node 230. For example, the insulating layer 320 mayhave a refractive index ranging between about 1.3 and about 1.5, whilethe borderless contact buffer layer 310 may have a relatively lowrefractive index ranging between about 1.8 and about 2.5, and theunderlying silicon floating node may have a relatively high refractiveindex of greater than about 3, such as about 3.4. Therefore the bufferlayer 310 provides a gradual transition in refractive indices from theinsulating layer 320 to the buffer layer 310 to the underlying silicon.

During operation of the device 100 shown in FIGS. 3 and 4, lightimpingent on the floating node 230 does not pass directly through an STIelement. Instead, the impingent light propagates through the insulatinglayer 320 and the borderless contact buffer layer 310 to the floatingnode 230. Because the impingent light passes through materials withgradually increasing refractive indices, destructive interference andhigh reflection of the impingent light both may be decreased compared toconventional photodiode image sensors.

Moreover, the reduced destructive interference and reflection attainableby aspects of the present disclosure may be achieved with little or noimpact to manufacturing time and costs, thereby maintaining or improvingproduct yield. For example, manufacture of a photodiode image sensor orCIS device according to aspects of the present disclosure may beimplemented with existing manufacturing processes and materials and maybe easily implemented into existing CIS device fabrication procedures.

Although the present invention and its advantages have been described indetail, it should be understood that various changes, substitutions andalterations can be made herein without departing from the spirit andscope of the invention as defined by the appended claims. Moreover, thescope of the present application is not intended to be limited to theparticular embodiments of the process, machine, manufacture, compositionof matter, means, methods and steps described in the specification. Asone of ordinary skill in the art will readily appreciate from thedisclosure of the present invention, processes, machines, manufacture,compositions of matter, means, methods, or steps, presently existing orlater to be developed, that perform substantially the same function orachieve substantially the same result as the corresponding embodimentsdescribed herein may be utilized according to the present invention.Accordingly, the appended claims are intended to include within theirscope such processes, machines, manufacture, compositions of matter,means, methods, or steps.

1. A photodiode comprising: a well located in a substrate; a floatingnode located in the well; at least two shallow trench isolation (STI)regions located above the well and having sidewalls, the STI regionslaterally opposing the floating node and the sidewalls adjacent two endsof the floating node; a borderless contact buffer layer located over atleast the floating node; a dielectric layer located over the borderlesscontact buffer layer; and a borderless contact extending through thedielectric layer and the borderless contact buffer layer to andelectrically contacting the floating node.
 2. The photodiode of claim 1wherein the borderless contact buffer layer is selected from the groupconsisting of: SiON, SiN, and combinations thereof.
 3. The photodiode ofclaim 1 wherein the dielectric layer is selected from the groupconsisting of: silicon dioxide, low dielectric material, andcombinations thereof.
 4. The photodiode of claim 1 wherein a secondrefractive index of the borderless contact buffer layer is between afirst refractive index of the dielectric layer and a third refractiveindex of the floating node.
 5. The photodiode of claim 1 wherein thedielectric layer has a first refractive index of between about 1.3 andabout 1.5, the borderless contact buffer layer has a second refractiveindex of between about 1.8 and about 2.5, and the floating node has athird refractive index of greater than about
 3. 6. The photodiode ofclaim 1 wherein the well is doped with an n−type impurity and thefloating node is doped with an n+type impurity.
 7. A semiconductordevice, comprising: first and second adjacent wells located in asubstrate; a first transistor gate structure located over at least aportion of the first well; a floating node located in the second well;at least two shallow trench isolation (STI) regions located above thesecond well having sidewalls, and laterally opposing the floating nodeand the sidewalls adjacent two ends of the floating node; a borderlesscontact buffer layer located over at least the floating node and thefirst transistor gate structure; a dielectric layer located over theborderless contact buffer layer; a first borderless contact extendingthrough the dielectric layer and the borderless contact buffer layer tothe floating node; a second borderless contact extending through thedielectric layer and the borderless contact buffer layer to the firsttransistor gate structure; and an interconnect located over thedielectric layer and coupling the first and second borderless contacts.8. The device of claim 7 wherein the borderless contact buffer layer isselected from the group consisting of: SiON, SiN, and combinationsthereof.
 9. The device of claim 7 wherein the dielectric layer isselected from the group consisting of: silicon dioxide, low dielectricmaterial, and combinations thereof.
 10. The device of claim 7 wherein asecond refractive index of the borderless contact buffer layer isbetween a first refractive index of the dielectric layer and a thirdrefractive index of the floating node.
 11. The device of claim 7 whereinthe dielectric layer has a first refractive index of between about 1.3and about 1.5, the borderless contact buffer layer has a secondrefractive index of between about 1.8 and about 2.5, and the floatingnode has a third refractive index of greater than about
 3. 12. Thedevice of claim 7 wherein the second well is doped with an n−typeimpurity and the floating node is doped with an n+type impurity.
 13. Thedevice of claim 7 wherein the first well is doped with a first impuritytype and the second well is doped with a second impurity type oppositeto the first impurity type.
 14. The device of claim 13 furthercomprising: a third well doped with the first impurity type and locatedadjacent the second well on a side opposite the first well; and a secondtransistor gate structure located over portions of the second and thirdwells.
 15. A CMOS image sensor device, comprising: a well located in asubstrate; a floating node located in the well having a first refractiveindex; shallow trench isolation (STI) regions located above the well andhaving sidewalls, the STI regions laterally opposing the floating nodeand the sidewalls adjacent two ends of the floating node; a borderlesscontact buffer layer located over at least the floating node having amedium refractive index that is lower than the first refractive index;an insulating layer located over the borderless contact buffer layerhaving a lower refractive index that is lower than the medium refractiveindex; and a borderless contact extending through the insulating layerand the borderless contact buffer layer to the floating node.
 16. TheCMOS image sensor device of claim 15, wherein the first refractive indexis greater than about
 3. 17. The CMOS image sensor device of claim 15,wherein the first refractive index is within the range of greater than 3to about 3.4.
 18. The CMOS image sensor device of claim 17, wherein themedium refractive index is within the range of greater than 1.7 to lessthan 2.6.
 19. The CMOS image sensor device of claim 18, wherein thelower refractive index is within the range of greater than about 1.2 toless than 1.6.
 20. The CMOS image sensor device of claim 15, wherein thefirst refractive index is greater than 3, the medium refractive index isbetween 1.8 to 2.5, the lower refractive index is between 1.3 to 1.5,and wherein the borderless contact buffer layer provides a gradualtransition from the refractive index of the insulating lower to therefractive index of the floating node.